KAIST Academic System

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Program	Common [공통(상호인정)]	Course Type	Major Elective [ 전공선택 ]
Course Code	39.473	Course No	CBE473
Section		English
L:L:C(AU)	3:0:3.0(0)	Exam time (classroom)	- Mon: 13:00~15:45 ()
Course Title	Microelectronics Processes [ 미세전자공정 ]
Class time (classroom)	Mon: 13:00~14:30 / (W1-3)Dept. of Chemical & Biomolecular Engineering [ (W1-3)생명화학공학과 ] (2116) Wed: 13:00~14:30 / (W1-3)Dept. of Chemical & Biomolecular Engineering [ (W1-3)생명화학공학과 ] (2116)
Notice

Program

Common [공통(상호인정)]

Course Type

Major Elective [ 전공선택 ]

Course Code

39.473

Course No

CBE473

Section

English

L:L:C(AU)

3:0:3.0(0)

Exam time
(classroom)

- Mon: 13:00~15:45
()

Course Title

Microelectronics Processes [ 미세전자공정 ]

Class time
(classroom)

Mon: 13:00~14:30 / (W1-3)Dept. of Chemical & Biomolecular Engineering [ (W1-3)생명화학공학과 ] (2116)
Wed: 13:00~14:30 / (W1-3)Dept. of Chemical & Biomolecular Engineering [ (W1-3)생명화학공학과 ] (2116)

Notice


Name	우성일(Woo, Seong Ihl)
Department	생명화학공학과(Department of Chemical and Biomolecular Engineering)
Phone	042-350-3918
E-Mail	wsi@kaist.ac.kr

Name

우성일(Woo, Seong Ihl)

Department

생명화학공학과(Department of Chemical and Biomolecular Engineering)

Phone

042-350-3918

E-Mail

wsi@kaist.ac.kr

Syllabus File	Syllabus_CBE473.hwp
Syllabus URL
Summary of Lecture	The representative unit process for microelectronic process such as epitaxial growth, CVD, diffusion, thermal oxidation et al. were introduced. It will be explained how these unit process are assembled to manufacture microelectronic devices.
Material for Teaching	Textbook: Fabrication Engineering at the Micro- and Nano scale, 3rd Ed., Oxford University Press (2008).
Evaluation Criteria	Grading: Mid-term exam (40%), Final Exam (40%), Term paper (10%), HW (10%).
Lecture Schedule	1st week: Introduction 2nd week: Semiconductor Substrate 3rd week: Diffusion 4th week: Thermal Oxidation 5th week: Ion Implantation 6th week: Rapid Thermal Processing 7th week: Optical Lithography. 8th week: Photoresist 9th week: Etching 10th week: Evaporation and Sputtering 11th week: Chemical Vapor Deposition 12th week: Epitaxial Growth 13th week: Isolation, Junction and Metallization 14th week: CMOS Technology
Memo

Syllabus File

Syllabus_CBE473.hwp

Syllabus URL

Summary of Lecture

The representative unit process for microelectronic process such as epitaxial growth, CVD, diffusion, thermal oxidation et al. were introduced. It will be explained how these unit process are assembled to manufacture microelectronic devices.

Material for Teaching

Textbook: Fabrication Engineering at the Micro- and Nano scale, 3rd Ed.,
Oxford University Press (2008).

Evaluation Criteria

Grading: Mid-term exam (40%), Final Exam (40%), Term paper (10%), HW (10%).

Lecture Schedule

1st week: Introduction
2nd week: Semiconductor Substrate
3rd week: Diffusion
4th week: Thermal Oxidation
5th week: Ion Implantation
6th week: Rapid Thermal Processing
7th week: Optical Lithography.
8th week: Photoresist
9th week: Etching
10th week: Evaporation and Sputtering
11th week: Chemical Vapor Deposition
12th week: Epitaxial Growth
13th week: Isolation, Junction and Metallization
14th week: CMOS Technology

Memo

Infomation of Course

Information of Professor

Plan of Lecture